发明名称 |
High dielectric constant barium-strontium-niobium oxides for integrated circuit applications |
摘要 |
A charge storage device, such as an integrated circuit memory, including a dielectric comprising a barium-strontium-niobium oxide. A liquid precursor including the metals barium, strontium, and niobium is prepared and applied to a platinum electrode. The precursor is baked and annealed to form a dielectric having the formula BaxSryNbzO30, where x=1.3 to 3.5, y=1.5 to 3.7, and z=10. A top platinum electrode is then formed to provide a memory cell capacitor. Optimum results to date have been obtained with Ba2Sr3Nb10O30, which yields a memory cell dielectric with dielectric constant over 1000 and a leakage current of less than 10-5 amperes per square centimeter for voltages up to 5 volts.
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申请公布号 |
US5751034(A) |
申请公布日期 |
1998.05.12 |
申请号 |
US19970873827 |
申请日期 |
1997.06.12 |
申请人 |
SYMETRIX CORPORATION |
发明人 |
CUCHIARO, JOSEPH D.;JOSHI, VIKRAM;DACRUZ, CLAUDIA P.;MCNELIS, JOHN M.;PAZ DE ARAUJO, CARLOS A. |
分类号 |
H01L21/02;H01L21/314;H01L21/316;(IPC1-7):H01L29/76 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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