发明名称 |
MICROWAVE CVD METHOD FOR DEPOSITION OF ROBUST BARRIER COATINGS |
摘要 |
<p>A composite material including a microwave-plasma-enhanced-chemical-vapor-deposited silicon oxide barrier coating deposited atop a temperature sensitive substrate obtained by a method including : providing the substrate within a deposition region in an evacuable deposition chamber; evacuating said chamber to a sub-atmospheric pressure; performing a plasma pretreatment of the substrate; introducing a precursor gaseous mixture including at least a silicon-hydrogen containing gas and an oxygen containing gas into said deposition region; directing microwave energy from a source of microwave energy to the deposition region, thereby creating a plasma by interaction of said microwave energy and said precursor gaseous mixture; depositing from said plasma, onto said substrate, the coating, thus providing the coated substrate with oxygen and water vapor barrier properties greater than the non-coated substrate; and introducing a sufficient flow rate of oxygen-containing gas into said precursor gaseous mixture to substantially eliminate the inclusion of silicon-hydrogen bonds into the deposited coating. <IMAGE></p> |
申请公布号 |
EP0840551(A1) |
申请公布日期 |
1998.05.13 |
申请号 |
EP19960912599 |
申请日期 |
1996.04.08 |
申请人 |
ENERGY CONVERSION DEVICES, INC. |
发明人 |
IZU, MASATSUGU;DOTTER, BUDDIE, R., II |
分类号 |
B65D65/42;C23C16/02;C23C16/04;C23C16/40;C23C16/50;C23C16/511;C23C16/52;C23C16/54;H01J37/32;(IPC1-7):A22C13/00;B29D23/00;B29D22/00 |
主分类号 |
B65D65/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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