| 摘要 |
PROBLEM TO BE SOLVED: To enhance etching resistance and post exposure delay(PED) stability by using a specified copolymer for the resin of a photosensitive film. SOLUTION: The photosensitive film contains a resin and a mixture of an acid photogenerator and many kinds of additives and the resins comprise the copolymer represented by formula I and the copolymer represented by formula II and in formulae I and II, (x) is 50-90mol%; (y) is 10-50mol%; R1 is a dissolution inhibitor, such as methyl, ethyl, or t-butyl group or the like; and R2 is H atom or methyl group, thus permitting the etching resistance to be enhanced by using polymethyl methacrylate (PMMA) having a high transmissibility at 193nm and combining 4-piperidinecarboxylic acid, and a matrix resin to be manufactured so as to enhance the PED stability by allowing the nitrogen atoms in the piperidine to act on the base.
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