Deposition of a thin film on a substrate using a multi-beam source

摘要

The disclosure relates to a multi-beam source for deposition of a material on to a substrate with enhanced deposition rate, uniformity and beam directionality. A plurality of orifices (59) are provided in a head unit (51,52) having a cavity (54) containing a vapor of the deposition material. The cavity and the vapor contained therein are maintained at a high temperature by heating filaments (56) to increase the deposition rate. The orifices are maintained at the same high temperature and act as heated collimators to produce highly directional beams for deposition of materials into high aspects ratio features. When used in jet vapor deposition techniques, an inert gas flow is introduced into the cavity and forced out thereof through the orifices as jets to transport particles of the deposition material to the substrate.