发明名称 Multi-beam laser exposure unit having anamorphic lens comprising three lenses
摘要 A multi-beam laser exposure unit includes a light beam deflector for deflecting light beam in a predetermined direction, a plurality of laser devices, a pre-deflection optical system, including a glass lens and a plastic lens, for converting a cross sectional shape of light beam emitted from the respective laser devices to a predetermined shape, and a post-deflection optical system, including three lenses for image-forming each light beam deflected by the deflector to be scanned on a predetermined image surface at a uniform speed. Power of three lenses of the post-deflection optical system is defined to be positive, negative, positive in order in a direction parallel to a rotational axis of each of reflective surfaces of the deflector from the side close to the deflector. Also, the power of three lenses of the post-deflection optical system is defined to be positive, negative, positive in order in a direction perpendicular to the rotational axis. Thereby, an effective deflection angle can be enlarged and a registration error can be reduced.
申请公布号 US5748355(A) 申请公布日期 1998.05.05
申请号 US19950527781 申请日期 1995.09.13
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 SHIRAISHI, TAKASHI;YAMAGUCHI, MASAO
分类号 B41J2/44;G02B13/00;G02B13/08;G02B26/10;G02B26/12;(IPC1-7):G02B26/08 主分类号 B41J2/44
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