| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive material processing device capable of preventing the occurrence of unequal processing by preventing the fall of the temp. of the photosensitive material in a space developing section and the processing liquid applied thereon. SOLUTION: When a hot air guide plate 160 exists at an open position, one end of a buffer section 26 is opened and apertures at two points including vent holes 162 are formed in this buffer section 26. In this state, part of the hot air generated by a fan 105 and a heater 106 is circulated in a circulation route from a drying section 34, then through a stabilizing section 33, developing section 32 and the buffer section 26 again to the drying section 34. The space developing section from a developer applying mechanism 43 to a pair of wringer rollers 44, 45 is also heated by the hot air circulating in the circulation route described above. |
