发明名称 |
Semiconductor memory device with capacitor, for DRAM |
摘要 |
A semiconductor memory device has a transfer transistor formed on the substrate, and including drain and source regions. A storage capacitor is electrically coupled to a of drain and source region of the transfer transistor. The storage capacitor comprises: (1) a trunk-like conductive layer with a bottom part electrically coupled to one of drain and source regions, and with one upwardly extending part after extending a distance from the bottom with one approximately upward direction, then extending circumferentially with approximately horizontal direction; (2) a branch-like up conductive layer electrically coupled to above of the trunk-like conductive layer; (3) at least a branch-like down conductive layer with a cross section like L-shape and connected to on down surface of the branch-like up conductive layer. The trunk-like conductive layer, the branch-like up conductive layer, and type branch-like down conductive layer constitute a storage electrode of the storage capacitor. At least one trunk-like conductive layer, with a cross section similar to L shape, whose one end connected to upper surface of the trunk-like conductive layer, the trunk-like conductive layer and branch-like conductive layer constituting a storage electrode of the storage capacitor. A dielectric layer is formed on the truck-like conductive layer and exposed surface of branch-like conductive layer; (6) a upper conductive layer formed on the dielectric, constituting one opposed electrode of the storage capacitor.
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申请公布号 |
DE19720272(A1) |
申请公布日期 |
1998.02.19 |
申请号 |
DE19971020272 |
申请日期 |
1997.05.14 |
申请人 |
UNITED MICROELECTRONICS CORP., HSINCHU CITY, TW |
发明人 |
CHAO, FANG-CHING, HSINCHU CITY, TW |
分类号 |
H01L21/8242;H01L27/108;(IPC1-7):H01L27/108;H01L21/824 |
主分类号 |
H01L21/8242 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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