发明名称 Semiconductor memory device with capacitor, for DRAM
摘要 A semiconductor memory device has a transfer transistor formed on the substrate, and including drain and source regions. A storage capacitor is electrically coupled to a of drain and source region of the transfer transistor. The storage capacitor comprises: (1) a trunk-like conductive layer with a bottom part electrically coupled to one of drain and source regions, and with one upwardly extending part after extending a distance from the bottom with one approximately upward direction, then extending circumferentially with approximately horizontal direction; (2) a branch-like up conductive layer electrically coupled to above of the trunk-like conductive layer; (3) at least a branch-like down conductive layer with a cross section like L-shape and connected to on down surface of the branch-like up conductive layer. The trunk-like conductive layer, the branch-like up conductive layer, and type branch-like down conductive layer constitute a storage electrode of the storage capacitor. At least one trunk-like conductive layer, with a cross section similar to L shape, whose one end connected to upper surface of the trunk-like conductive layer, the trunk-like conductive layer and branch-like conductive layer constituting a storage electrode of the storage capacitor. A dielectric layer is formed on the truck-like conductive layer and exposed surface of branch-like conductive layer; (6) a upper conductive layer formed on the dielectric, constituting one opposed electrode of the storage capacitor.
申请公布号 DE19720272(A1) 申请公布日期 1998.02.19
申请号 DE19971020272 申请日期 1997.05.14
申请人 UNITED MICROELECTRONICS CORP., HSINCHU CITY, TW 发明人 CHAO, FANG-CHING, HSINCHU CITY, TW
分类号 H01L21/8242;H01L27/108;(IPC1-7):H01L27/108;H01L21/824 主分类号 H01L21/8242
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