Apparatus for plasma enhanced chemical vapour deposition of polycrystalline diamond

摘要

Appts. comprises a: vacuum chamber (4); locks for transferring the substrate; an appts. in the vacuum chamber for conveying the substrate through one but pref. two treatment stations; microwave plasma sources (8,8') forming a 2nd group and hot wire sources (5,5') forming a 1st group above the substrate surface; electrode (11) having radio frequency arranged below the substrate surface to produce a polarising potential; and gas feed pipes (6,9) protruding into the vacuum chamber (4). The hot wire arrangement (5,5') extends across the substrate transporting direction (A) and a 1st coating zone (Z') is formed. The microwave plasma sources (8,8') are arranged in series at a distance parallel to the hot wire sources (5,5') and together form a 2nd coating zone (Z<2>).