MANUFACTURE OF THERMAL TREATMENT, VACUUM CVD DEVICE, AND THIN FILM DEVICE,申请号JP19960182505-传众专利搜索

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发明名称	MANUFACTURE OF THERMAL TREATMENT, VACUUM CVD DEVICE, AND THIN FILM DEVICE
摘要
申请公布号	JPH1027759(A)	申请公布日期	1998.01.27
申请号	JP19960182505	申请日期	1996.07.11
申请人	SEIKO EPSON CORP	发明人	MIYASAKA MITSUTOSHI
分类号	H01L21/285;H01L21/205;H01L21/22;H01L21/31;H01L21/324;H01L21/336;H01L29/786;(IPC1-7):H01L21/205	主分类号	H01L21/285
代理机构		代理人
主权项
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