发明名称 Adhesive composition curable upon exposure to radiation and applications therefor
摘要 An adhesive composition, a laminated structure, and a method of laminating a structure. The adhesive composition comprises an admixture of unsaturated polymerizable material and a photoreactor, the photoreactor comprising a wavelength-specific sensitizer covalently bonded to a reactive species-generating photoinitiator. Suitable wavelength-specific sensitizers have a molar extinction coefficient greater than about 5000 liters per mole per cm at an absorption maximum and resulting photoreactors have a quantum yield of greater than about 0.5 at an absorption maximum. Suitable photoreactors include 2-[p-(2-methyllactoyl)phenoxy]ethyl-1,3-dioxo-2-isoindolineacetate, 2-hydroxy-2-methyl-4'-[2-[p-(3-oxobutyl)phenoxy]ethoxy]propiophenone, 4-[p-[(4-benzoylcyclohexyl)oxy]phenyl]-2-butanone, and 1,3-dioxo-2-isoindolineacetic acid diester with 2-hydroxy-4'-(2-hydroxyethoxy)-2-methylpropiophenone. The laminated structure includes at least two layers bonded together with the adhesive composition, in which at least one layer is a cellulosic or polyolefin nonwoven web or film. The laminated structure is made by irradiating the adhesive composition to cure the adhesive composition.
申请公布号 US5709955(A) 申请公布日期 1998.01.20
申请号 US19960733086 申请日期 1996.10.16
申请人 KIMBERLY-CLARK CORPORATION 发明人 NOHR, RONALD SINCLAIR;MACDONALD, JOHN GAVIN
分类号 C08J3/28;C08F2/50;C09D4/00;C09J4/00;C09J4/02;G03F7/028;G03F7/029;G03F7/031;(IPC1-7):C08F2/50 主分类号 C08J3/28
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