发明名称 MEMBRANE PROBE AND WAFER PROBER WITH MEMBRANE PROBE
摘要 PROBLEM TO BE SOLVED: To provide a membrane probe in which a uniform contact pressure can be obtained even when the thickness of wafer is varied after consecutive measurement of a large number of wafers. SOLUTION: A piezoelectric element 20 is mounted at a part on the surface of a thin film probe part 2. The piezoelectric element 20 is connected through electric wiring with a detection circuit 21 provided in a wafer prober. Since the thin film probe part 2 is movable, a bump 3 slides by severalμm on a pad provided on the wafer when the bump 3 touches the pad at the time of measurement. A pressure is applied to the piezoelectric element 20 arranged on the surface of the thin film probe part 2 depending on the micro motion thereof and a micro potential is generated. The micro potential is detected by the detection circuit 21 and the vertical movement of the stage of wafer prober is controlled based on the detection results. According to the arrangement, a uniform contact pressure can be sustained for an object to be measured.
申请公布号 JPH1010156(A) 申请公布日期 1998.01.16
申请号 JP19960159384 申请日期 1996.06.20
申请人 MITSUBISHI ELECTRIC CORP 发明人 NAKAJIMA YASUHARU;INOUE AKIRA;OTA YUKIO
分类号 G01R31/26;G01R1/073;H01L21/66;(IPC1-7):G01R1/073 主分类号 G01R31/26
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