METHOD AND DEVICE FOR PROTECTING SUSCEPTOR BY USING CERAMIC WAFER DURING PROCESS CHAMBER CLEANING

摘要

PROBLEM TO BE SOLVED: To extend life of a susceptor add reduce frequency of switching of the susceptor by a method wherein a ceramic wafer is conveyed on the susceptor before a cleaner is introduced into the chamber. SOLUTION: A ceramic wafer 40 is mounted on a susceptor 12. Thereby, the susceptor 12 is protected from fluorine gas injected into a chamber from a gas mixer 19 during cleaning operations. This ceramic wafer 40 functions as a dielectric and limits a RF electric field between a manifold 11 and the susceptor 12. Next, the susceptor 12 is lifted up until a desirable height with respect to cleaning plasma by a motor controlled by a processor, and a cleaner, which typically contains fluorine, is introduced into the chamber. After the cleaning is completed and a RF power source is turned off, the chamber is again purged using inert gas such as nitrogen, etc. After a vacuum is turned off, a ceramic wafer is fetched out from the chamber.