| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photopolymerizable composition which, when it is subjected to polymerization by ultraviolet irradiation, is insuscepible to the adverse effect of oxygen, and can polymerize to a polymer having a high polymerization degree while maintaining a polymer yield at a high level, at a high polymerization rate, even when a thin film having a thickness of a 100μm or less is subjected to polymerization, and an acrylic pressure sensitive adhesive which is excellent with respect to the balance between adhesion strength and cohesion at high temperatures. SOLUTION: This photopolymerizable composition comprises a vinyl monomer component mainly composed of a (meth)acrylic alkyl ester, mixed with a photopolymerization initiator A having a molar light absorption coefficient at a wavelength of 365nm of 200 (1.mol<-1> .cm<-1> ) or more and a photopolymerization initiator B having a molar light absorption coefficient at a wavelength of 365nm of 200 (1.mol<-1> .cm<-1> ) or less. This acrylic type pressure sensitive adhesive is prepd. by a method comprising polymerizing the vinyl monomer component through irradiation of an ultraviolet ray to the above photopolymerizable composition.
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