发明名称 RADIATION SENSITIVE COMPOSITION
摘要 PROBLEM TO BE SOLVED: To obtain a radiation sensitive compsn. effectively sensitive to various radiant rays such as UV, excellent in resolution, developability, etc., and stably forming a high precision fine pattern by incorporating two kinds of copolymers each consisting of specified repeating units. SOLUTION: This radiation sensitive compsn. contains a copolymer consisting of repeating units represented by formula I and repeating units represented by formula II, a copolymer contg. repeating units represented by formula III and repeating units represented by the formula I and a radiation sensitive acid generating agent. In the formula I, R1 is H or methyl. In the formula II, R2 is H or methyl, R3 is H, 1-10C chain alkyl, etc., each of R4 and R5 is 1-10C chain alkyl, etc., and two of R3 -R5 may bond to each other to form a 5- to 7-membered ring. In the formula III, R6 is H or methyl.
申请公布号 JPH09292709(A) 申请公布日期 1997.11.11
申请号 JP19970045109 申请日期 1997.02.28
申请人 JAPAN SYNTHETIC RUBBER CO LTD 发明人 IWANAGA SHINICHIRO;SAKURAI AKIHIKO;TANABE TAKAYOSHI;TSUJI AKIRA
分类号 G03F7/004;C09K3/00;G03F7/039;H01L21/027;(IPC1-7):G03F7/039 主分类号 G03F7/004
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