| 摘要 |
PROBLEM TO BE SOLVED: To decrease frictional force, to prevent sucking of a head or splashing of a lubricant oil, to decrease and to stabilize the floating height of a head by depositing a soln. containing dispersion of SiO2 fine particles on a substrate and making difference in the diameter of projections between a CSS area and a data area. SOLUTION: SiO2 fine particles having 1nm to 1μm particle size are dispersed in an alcohol as a masking agent, diluted with the same solven and applied in the area from the center of a substrate to 18 to 20mm distance from the center by 0.1 to 10% deposition rate. The substrate is etched to leave only the deposited area as projections while other part is made as a recess. After etching, the soln. having dispersion of fine particles is deposited in the area from 20mm distant from the center to the outer circumference and the substrate is etched to form a rough pattern. Then the SiO2 fine particles are removed. Thereby, 10 to 500nm projection diameter is obtd. in the CSS area, while 1 to 500 nm projection diameter is obtd. in the data area. By making difference in the projection diameter in the two areas, frictional force is decreased and sucking of a head can be prevented in the CSS area, and splashing of a lubricant oil can be prevented and the floating height of a head is suppressed to 50nm and can be stabilized in the data area.
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