Stress-free mount for imaging mask

摘要

An imaging mount and apparatus that reduces or eliminates stress induced in an imaging mask mounted thereto. The mount comprises a support block and a trio of mounting pads connected thereto. At least two of the mounting pads are connected to the support block so that their respective positions are adjustable within a predetermined plane which is preferably substantially parallel to a surface of a substrate to be imaged. Each of the mounting pads including means for securing the imaging mask generally parallel to the predetermined plane. The positions the adjustable mounting pads adjust within the predetermined plane responsive to securing of the lithography mask thereto so that the imaging mask is essentially undeflected due to the securing thereof. The absence of deformation (and, as a result, stress) in the imaging mask due to its being secured to the mount reduces the degree of distortion of radiation passing through the mask and to the imprinted surface.