| 摘要 |
<p>PURPOSE: To form a correction film which is not erroneously detected by a dust inspecting machine by forming this correction film in such a manner as to fill the groove part formed in a glass substrate in the defective part where a light shielding film lacks. CONSTITUTION: The light shielding film 3 consisting of chromium (Cr), etc., is formed on the glass substrate 4 and a photomask is formed. While the region enclosing the defective part 1 of the light shielding film lacks existing in the light shielding film 3 of this photomask is scanned with a convergent ion beam 2, the region is irradiated with this ion beam and is subjected to sputter etching. The surface part of the glass substrate 4 is dug by the sputter etching by such scanning with the convergent ion beam 2, by which the groove part 5 is formed. The depth of groove part 5 is set about the depth twice the thickness of the light shielding film 3. Next, the groove part 5 is scanned with the convergent ion beam 2 while an org. gas 6 blown to be adsorbed thereon, by which the org. gas 6 is brought into polymn. reaction and the correction film 7 consisting of a carbon film is deposited. The correction film 7 deposited up to the same height as the height of the light shielding film 3 is formed on the defective part 1 where light shielding film lacks.</p> |
