| 摘要 |
PROBLEM TO BE SOLVED: To provide a mask with which good wiring patterns are obtainable by eliminating the insufficiency of the local irradiation quantity of UV rays to the front surface of metallic foil which is an exposure surface and exposure method using the same. SOLUTION: This mask is loaded into an exposure device contg. a light source and a shutter and is used to image the wiring patterns on the surface of the photosensitive resist with which the surface of metallic foil is coated. This mask is provided with slits 13 in correspondence to the parts where the film thickness of the photosensitive resist increases in the exposed regions separately from the wiring patterns 14. As a result, the remaining of the resist occurring in the local insufficiency of the light for irradiation is eliminated and the good wiring patterns are obtd. |
