发明名称 GAS FOR ULTRAVIOLET LASER OSCILLATION AND MANUFACTURE THEREOF
摘要 PROBLEM TO BE SOLVED: To reduce the number of exchanging a gas cylinders so as to improve work efficiency for allowing prevention of the drop in accuracy of a laser abrasion process by constituting a dilusion gas of a gas for ultraviolet laser oscillation only of a neon gas. SOLUTION: F2 gas is enclosed in a cylinder 1 in the state of being diluted with Ne gas and Ne gas is enclosed in a cylinder 2 and Kr gas is enclosed in a cylinder 3. When open/close valves 1a, 2a, 3a of respective cylinders 1, 2, 3 are opened, prescribed amounts of gases are supplied from respective pipings 4, 5, 6 are supplied from respective pipings 4, 5, 6 inside a mixing holder 8. Ne-diluted KrF gas of a prescribed constitution is formed inside the mixing holder 8 for being stored in a constitutionally stable state. The Ne-diluted KrF gas thus manufactured is subdivided into cylinders for being used as laser gases of an ultraviolet laser oscillator 10. The Ne-diluted KrF gas han an extremely little drop in a laser output accompanying a lapse of oscillation time so as to produce no ill effect on processing accuracy.
申请公布号 JPH09237944(A) 申请公布日期 1997.09.09
申请号 JP19960071392 申请日期 1996.02.29
申请人 BROTHER IND LTD 发明人 AOKI HIKOHARU
分类号 H01S3/227;(IPC1-7):H01S3/227 主分类号 H01S3/227
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