| 摘要 |
PURPOSE:To uniformize film quality, make the film in large area, and improve productivity, by making an active core produced from chemical matter for film formation chemically react with an active core produced by decomposition of compound containing silicon or germanium, and halogen. CONSTITUTION:An active core A produced by decomposing compound containing silicon or germanium and halogen, and an active core B produced from chemical matter for film formation having chemically mutual reaction with this active core A are individually introduced into a film-formed space. An epitaxial piled film of silicon or germanium is formed on a heated/held substrate by making the chemically react. As compound containing silicon and halogen introduced into the said film-formed space, for example, compound, in which one or the whole part of hydrogen atoms in chain-shaped or ring-shaped hydrogen silicon compound is replaced by halogen atoms, is used. As a method of manufacturing the respective active cores A and B, electrical energy of micro wave, RF, low frequency, DC, and so on, heat energy by heater heating, infrared heating, and so on, and excitation energy such as light energy and the like are used. |
