发明名称 |
WAFER INSPECTION APPARATUS |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a wafer inspection apparatus which enables simplification of structure and reduction in time for the inspection process by adding a macroscopic inspection function to a wafer positioning section. SOLUTION: This apparatus includes a microscopic inspection section 12 for performing microscopic observation of a wafer 2 selectively supplied from a carrier 1, and a wafer positioning section for vacuum checking the wafer 2 to a rotary table 70 by vacuum suction to rotate the wafer 2 and then detecting a positioning cut-out portion formed on the peripheral edge of the wafer 2 so as to position the wafer. The rotary table 70 has a rotation axis which moves up and down. The rotation axis may be inclined to swing in an arbitrary direction by a joy stick 24. Thus, with the same rotary table 70, the wafer 2 is positioned or inclined to swing by the joy stick 24 so as to perform microscopic observation.</p> |
申请公布号 |
JPH09186209(A) |
申请公布日期 |
1997.07.15 |
申请号 |
JP19970002923 |
申请日期 |
1997.01.10 |
申请人 |
OLYMPUS OPTICAL CO LTD |
发明人 |
NAGAI KAZU;YAMANA GENICHI;HANZAWA EIICHI;URIYUUTA AKIRA;NIREI TATSUO;IBARAKI HIDEFUMI |
分类号 |
G01B21/00;G01N21/84;G01N21/88;G01N21/94;G01N21/956;G02B21/00;H01L21/66;H01L21/68;(IPC1-7):H01L21/66 |
主分类号 |
G01B21/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|