| 摘要 |
<p>PROBLEM TO BE SOLVED: To obtain an optical element capable of forming a pattern with high resolution and high contrast and an exposure device using the same by forming a periodic pattern having period near to exposure wavelength in the longitudinal direction of the pattern with respect to the pattern. SOLUTION: A reticle 19 is provided with the periodic fine pattern 2 having the period nearly the same as that of the exposure wavelength in the longitudinal direction of the circuit pattern 1 of an LSI performing image formation. Since the pattern 2 is formed in a direction crossing at a right angle with the longitudinal direction of the pattern 1, the mainly polarizing direction of light passing through the pattern 2 coincides with the longitudinal direction of the pattern 1. By making use of the characteristic of the pattern 2 of the exposure wavelength order, optimum polarizing condition can be obtained for the individual circuit pattern 1 on the reticle 19. As a result, the contrast in the case of image forming is improved, and the improvement of depth of focus and limit image performance can be attained.</p> |
