| 摘要 |
PROBLEM TO BE SOLVED: To decrease the inclination of a surface plate in polishing so as to be capable of sufficiently uniformly polishing a polishing object even if a rather hard polishing cloth is used. SOLUTION: A surface plate 5 is supported with bearings 32-34 arranged between a rotating shaft 5b and a supporting member 4 so as to be capable of rotating to the supporting member 4. The back surface 35 of a table 5a slides on a sliding surface through a slide bearing 36, and lubricating oil for reducing sliding frictional resistance is supplied to the sliding surface from a lubricating oil supply pipe 38. A rotating shaft 5b is energized downward by the reaction force of the fastening force of a nut 44 which is fastened so as to press and energize the inner circumferential part of an angular bearing 34 through a spacer 42 and a plate spring 43, and by the energizing force, floating of the surface plate 5 during rotation is suppressed. Even if a portion away from a rotating shaft center of a polishing object such as a wafer is pressed, the surface plate 5 is not practically inclined since the back surface 35 of the table 5a is regulated by the sliding surface 34. |
