| 摘要 |
A high frequency transistor including a heavily doped first current carrying layer positioned on a substrate and a semi-insulating layer of LTGaAs epitaxially grown on the first layer. The semi-insulating layer is etched, using a layer of AlAs as an etch stop, to define an active region and a first current carrying electrode is grown on the exposed first layer in the active region. A control layer is grown on the semi-insulating layer and the first current carrying electrode, and a second current carrying electrode is grown on the control layer. External contacts are formed on the first current carrying layer, the control layer, and the second current carrying electrode.
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