| 发明名称 |
Apparatus and method for polishing substrates |
| 摘要 |
<p>An apparatus for polishing substrates; comprising: at least two substrates to be polished; at least two second polishing surfaces; a rotatable carousel; at least two first substrate head assemblies suspended from said carousel and holding thereon respective ones of said substrates; a positioning member coupled to said carousel to move said carousel and thereby position a selected one of said substrate heads over a selected one of said polishing surfaces.</p> |
| 申请公布号 |
EP0774323(A2) |
申请公布日期 |
1997.05.21 |
| 申请号 |
EP19960307781 |
申请日期 |
1996.10.28 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
PERLOV, ILYA;GANTVARG, EUGENE;LEE, HARRY Q.;TOLLES, ROBERT D.;SHENDON, NORM;SOMEKH, SASSON |
| 分类号 |
B24B27/00;B24B37/30;B24B37/34;B24B41/00;B24B53/007;B24B53/017;B24B53/12;B24B57/02;H01L21/00;H01L21/304;H01L21/306;(IPC1-7):B24B37/04 |
主分类号 |
B24B27/00 |
| 代理机构 |
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