发明名称 SEMICONDUCTOR MEMORY DEVICE AND ITS PREPARATION
摘要 <p>PROBLEM TO BE SOLVED: To eliminate the limitation of the number of times for writing/erasing data by charging a floating electrode, and providing a switching element which makes the floating gate electrode discharge the charged electric charge. SOLUTION: A multilayer transistors M1, 1-Mn, n of a memory cell (for data memory) containing floating gates F and G and control gates C and G are arrayed in multiple numbers in matrix. pass-transistors Q1, 1-Q1, n wherein switching is so performed that the floating gates F and G of the multilayer transistors M1, 1-Mn, n of each data memory are charged with electric charge and the charged electric charge is discharged for writing/erasing a cell are configured so that a pair is established with the lamination type transistors M1, 1-M, n for the data memory. Thus, since no electron capture occurs in a gate insulation film, they are used as DRAMs with no limitation to writing or erasing of data.</p>
申请公布号 JPH09129837(A) 申请公布日期 1997.05.16
申请号 JP19960281285 申请日期 1996.10.03
申请人 L G SEMICON CO LTD 发明人 GUN HIYON BAKU
分类号 G11C14/00;H01L21/8247;H01L27/10;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L27/10;H01L21/824 主分类号 G11C14/00
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