A process for brush cleaning used in semiconductor wafer scrubbing systems. A process for brush cleaning that eliminates and/or reduces the load-up of brushes with contaminants. This brush cleaning process changes the pH level of a brush to repel contaminants that are on the brush. This process extends the useful life of the brush without significantly decreasing the throughput of the scrubbing system.
申请公布号
WO9717147(A1)
申请公布日期
1997.05.15
申请号
WO1996US18095
申请日期
1996.11.08
申请人
ONTRAK SYSTEMS, INC.;SIMMONS, MARK, A.;KRUSELL, WILBUR, C.