发明名称 Verfahren zum Herstellen einer supraleitenden Einrichtung aus supraleitendem Material und dadurch hergestellte supraleitende Einrichtung
摘要 In a method of manufacturing a superconducting device which has a first thin film of oxide superconductor material formed on a substrate and a second thin film formed on the first thin film of oxide superconductor material, after the second thin film is deposited on the first thin film of oxide superconductor material, a multi-layer structure formed of the first and second thin films is patterned so that a side surface of the first thin film is exposed. In this condition, the whole of the substrate is heated in an O2 atmosphere or in an O3 atmosphere so that oxygen is entrapped into the first thin film of oxide superconductor material. Thereafter, the patterned multi-layer structure is preferably covered with a protection coating. <IMAGE>
申请公布号 DE69125425(D1) 申请公布日期 1997.05.07
申请号 DE1991625425 申请日期 1991.07.16
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD., OSAKA, JP 发明人 SAITOH, MITSUCHIKA, F-75116 PARIS, FR;TANAKA, SOU, F-75116 PARIS, FR;IIYAMA, MICHITOMO, F-75116 PARIS, FR
分类号 H01L39/24;(IPC1-7):H01L39/22 主分类号 H01L39/24
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