发明名称 In-situ sizing of photolithographic mask or the like, and frame therefore
摘要 Alignment of a mask, such as a photolithographic mask, to a workpiece, such as a printed circuit board is improved using a frame having sides that are individually thermally expandable. The mask is fabricated to be undersized so that the distance between fiducials on the mask is less than a desired distance, which may be the distance between corresponding fiducials on the workpiece. The mask is mounted on the frame, whereafter at least one side of the frame is heated to expand the side and stretch the mask to achieve the desired interfiducial distance.
申请公布号 US5626784(A) 申请公布日期 1997.05.06
申请号 US19950414898 申请日期 1995.03.31
申请人 MOTOROLA, INC. 发明人 SIMONS, EVERETT F.
分类号 G03F1/14;G03F7/20;H05K3/00;(IPC1-7):H05B3/06 主分类号 G03F1/14
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