首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
PLASMA APPARATUS AND DRY ETCHING METHOD USING THIS APPARATUS
摘要
申请公布号
JPH09115884(A)
申请公布日期
1997.05.02
申请号
JP19950273143
申请日期
1995.10.20
申请人
SONY CORP
发明人
KISHIMOTO KIYOSHI
分类号
H05H1/46;C23F4/00;H01L21/302;H01L21/3065;(IPC1-7):H01L21/306
主分类号
H05H1/46
代理机构
代理人
主权项
地址
您可能感兴趣的专利
PLACE OF OPERATION CHANGING DEVICE
METHOD AND APPARATUS FOR ADJUSTING HYBRID CIRCUIT
STRUCTURE OF COLOR SCREENING ELECTRODE OF IMAGE RECEIVING TUBE
SWITCHING DEVICE FOR GAS LIGHTER OF BATTERY TYPE
EXPOSURE EQUIPMENT
ELECTRIC STOVE
FORMATION OF FLANGE AND PRESS FORMING DIE USED THEREFOR
FORMATION OF THIN FILM PATTERN
ELECTROPHOTOGRAPHIC SENSITIVE BODY
BRIDLE-ROLL DEVICE
DATA TRANSFER SYSTEM
HEAT PIPE SPACE HEATER
HEAT ACCUMULATOR WITH DIFFERENT TEMPERATURE REGION
METHOD AND DEVICE FOR JOINTING ROLLING MATERIAL
MANUFACTURE OF SEMICONDUCTOR DEVICE
BODY STRUCTURE OF SHADOW MASK
RUBBER COMPOSITION
CHROMAN COMPOUND AND CHOLESTEROL-LOWERING AGENT CONTAINING SAME
QUINOLINE CARBOXYLIC ACID DERIVATIVE
CHROMINANCE DEMODULATING CIRCUIT OF VIDEO REPRODUCING DEVICE