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发明名称
Verfahren und Vorrichtung zur Plasmaätzung von Diamant
摘要
申请公布号
DE69218271(D1)
申请公布日期
1997.04.24
申请号
DE19926018271
申请日期
1992.01.20
申请人
SUMITOMO ELECTRIC INDUSTRIES, LTD., OSAKA, JP
发明人
NISHIBAYASHI, YOSHIKI, C/O ITAMI WORKS OF SUMITOM, ITAMI-SHI, HYOGO, JP;FUJIMORI, NAOJI, C/O ITAMI WORKS OF SUMITOMO, ITAMI-SHI, HYOGO, JP
分类号
C23F4/00;H01J37/32;H01L21/302;H01L21/3065;(IPC1-7):H01J37/32;H01L21/306
主分类号
C23F4/00
代理机构
代理人
主权项
地址
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