| 发明名称 |
Device for masking central and outer areas of substrate to be sputter coated |
| 摘要 |
The inner (26) and outer (4) masks of a sputter coating apparatus are movable independently of each other parallel to the longitudinal axis of the cathode (58) due to the pressure difference created by the outer atmospheric pressure (55) and the vacuum pressure (54) inside the work chamber.
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| 申请公布号 |
DE19614600(C1) |
申请公布日期 |
1997.04.24 |
| 申请号 |
DE19961014600 |
申请日期 |
1996.04.13 |
| 申请人 |
SINGULUS TECHNOLOGIES GMBH, 63755 ALZENAU, DE |
发明人 |
KEMPF, STEFAN, 63755 ALZENAU-ALBSTADT, DE |
| 分类号 |
C23C14/04;G11B7/26;H01J37/34;(IPC1-7):C23C14/04;C23C14/34 |
主分类号 |
C23C14/04 |
| 代理机构 |
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代理人 |
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| 主权项 |
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