| 摘要 |
PROBLEM TO BE SOLVED: To obtain a radiation-sensitive resin composition by mixing a specified copolymer with a phenolic compound, a specified melamine, and a specified onium salt and to provide a cured product of the composition, a negative resist resin composition, and a cured product of the resist resin composition. SOLUTION: This resin composition comprises a copolymer comprising an unsaturated carboxylic acid, a radical-polymerizable epoxy compound, and other radical-polymerizable compounds, a phenolic compound, a melamine of formula I (wherein R1 to R6 are each H or -CH2 OR; and R is H or a 1-6C alkyl) and an onium salt functioning as a photoinduced acid generator and represented by formula II wherein X is a group of formula III; R7 to R9 are each H, halogen, nitro, an alkoxyl, cyano, a 1-15C aliphatic group or an ester group; R10 to R19 are each H, a halogen, nitro, an alkoxyl, a 1-20C aliphatic group having -OH, an ether group, an ester group, acryloyl, epoxy or allyl in the structure, phenyl or the like; and Z is BF4 , PF6 or the like} or formula IV (wherein X and Z are each as defined in formula II; and R20 to R24 are each H, -OH or the like). |
