Isolated power transistor

摘要

A high current power transistor is provided that comprises a drain region that includes a highly-doped drain region (54) and a lightly-doped drain region (50). The channel region (52) is activated by a gate conductor (32) . The channel region separates the lightly-doped drain region (50) from a D-well region (40). A sidewall insulator body (44) is used to form the lightly-doped drain region (50) and the lightly-doped drain region (54). The transistor is formed in an active region (20) which comprises a portion of an n-type epitaxial layer (12) formed outwardly from a p-type substrate (10). The isolation structures (14) and (16) as well as the epitaxial layer (12) provides for a transistor that can be used in both source follower and common source configurations.