发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND SEMICONDUCTOR DEVICE USING THE SAME
摘要 PROBLEM TO BE SOLVED: To obtain an inexpensive photosensitive resin composition which can be used as a material for the insulating layers in multilayered printed wiring boards, has particularly high resolution and glass transition temperature, can form a desired pattern with reduced exposure to the light, and shows excellent electric properties such as insulating properties and dielectric constant. SOLUTION: This photosensitive resin composition constituting the insulating layers comprises tetraglycidyldiaminodiphenylmethane in which at least one of epoxy groups is acrylic- or methacrylic-modified, photoplymerizing monomers, a photopolymerization initiator, a filler selected from inorganic and organic fillers with an average particle size of 5.0μm-0.1μm, a curing agent and an organic solvent. The acrylic- or methacrylic-modified tetraglycidyldiaminodiphenylmethane is preferably prepared by reaction of 1.0 equivalent amount of tetraglycidyldiaminodiphenylmethane with 0.3-0.8 equivalent amount of an unsaturated monobasic acid.
申请公布号 JPH0971637(A) 申请公布日期 1997.03.18
申请号 JP19960037867 申请日期 1996.02.26
申请人 TOPPAN PRINTING CO LTD 发明人 NATORI KEIKO;TSUKAMOTO TAKETO;SEKINE HIDEKATSU;NAKAMURA KIYOTOMO;UMA UTSUKOKU
分类号 G03F7/032;C08F290/00;C08F299/02;C08G59/17;C08G59/40;H01L21/768;H01L23/522;H05K3/46 主分类号 G03F7/032
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