CARRIER FOR SEMICONDUCTOR WAFER AND CLEANING EQUIPMENT EMPLOYING IT

摘要

PROBLEM TO BE SOLVED: To obtain a carrier for semiconductor and a cleaning equipment employing it in which the drying time of IPA can be shortened. SOLUTION: The chuck system carrier 20A and wafer cleaner are constructed such that heaters 30 embedded in a pair of U-shaped rods 21A and three wafer supporting rod 22A are conducted and a wafer S, contained therein, is cleaned in C tank (water washing) and the water adhering to the wafer S is thermally evaporated forcibly before the water S is dried in an IPA tank.