| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a favorable electron emitting function by oxidizing the conductive film patterned between electrodes by a dry etching method. SOLUTION: An Au electrode 22 and an Au electrode 23 are made by a vacuum deposition method and a photolithography method. Organic Pd solution is applied on these electrodes 22 and 23, and these are baked in air to form a PdO fine particle film, and a photoresist is made in a fine particle formation area 24. Next, the whole face of this fine particle formation area 24 is dry- etched, and the PdO fine particle film in the region excluding the fine particle formation area 24 is lifted-off, and then the resist is peeled off, and an oxide fine particle film 34 is made between the electrodes 22 and 23. Next, this oxide fine particle film 34 is oxidized, and the reduction part 37 where PdO at the side part not covered with the photoresist is reduced into Pd is oxidized to form PdO, and the oxide fine particle film 34 is made highly resistant.</p> |
