| 摘要 |
<p>PROBLEM TO BE SOLVED: To make a search alignment of a wafer at a high speed without restricting an arrangement of a search mark on the wafer. SOLUTION: After positions of first and second search marks 47A, 47B are detected by using a first alignment sensor with respect to the first wafer and a coordinates system of referencing a search mark is acquired from detection results, under condition that the first search mark 47A is detected by the first alignment sensor, a position of a street line area 70 detected by a second alignment sensor is stored. With respect to a second sheet of wafer and after, under condition that the first search mark 47A is detected by the first alignment sensor, a position of the street line area 70 is detected by the second alignment sensor, and based on misalignment quantity between the detection results and the stored position, a coordinate system of referencing the search mark is acquired.</p> |
