| 摘要 |
PROBLEM TO BE SOLVED: To improve the uniformity of the development and process efficiency, allowing the consumption of a developing liq. to be possibly minimized. SOLUTION: A developing liq. is fed to a central area of the surface of a substrate W from a developing liq. nozzle 6, a flat plate member 13 separate from this nozzle is positioned above the substrate W with leaving specified gap S to face its lower flat surface 13a parallel to the surface of the substrate W, thereby expanding the developing liq. over the entire surface of the substrate W, and, with holding this condition, an exposed resist film on the surface of the substrate is developed after exposure thereof. |
