| 摘要 |
<p>PROBLEM TO BE SOLVED: To effctively prevent a wafer stage from becoming out of synchronization with a mask stage. SOLUTION: During scanning for an exposure, a wafer stage 20 is driven and controlled based on a speed command by a controller 40. The position of the stage 20 is measured by a W laser interferometer 26, and the time delay of the interferometer 26 is corrected by a first delay correction part 48. The position of a mask stage 22 is measured by an R laser interferometer 32, and a time delay of measurement of the interferometer 32 is corrected by a second delay correction part 50. As the stage 20 and the stage 22 can have the specific position relationship in an operator 52 and a controller 42, based on position data of the stage 20 after the time delay is corrected and position data of the stage 22 after the time delay is corrected, the stage 22 is driven and controlled.</p> |
