发明名称 Laser slag removal
摘要 A process is provided for removing slag from an aperture in a substrate, comprising the steps of: providing a protective coating on the substrate; drilling a hole through the substrate; and chemically removing slag from the aperture by complete or partial immersion of the substrate into a chemical bath. Additional process steps can include cleaning the stripped substrate and baking the substrate at a high temperature. A base coating can be provided on the substrate to promote adhesion of a chemically resistant coating to the substrate. Additionally, a protective coating can be applied to the chemically resistant coating to protect it during drilling. The chemically resistant layer can be a material, such as gold, that does not oxidize or dissolve when it is exposed to a chemical, such as phosphoric acid. Phosphoric acid can be heated to accelerate slag removal.
申请公布号 US5595668(A) 申请公布日期 1997.01.21
申请号 US19950417092 申请日期 1995.04.05
申请人 ELECTRO-FILMS INCORPORATED 发明人 MADDEN, JR., JEAN D.;KNAPP, CHRISTOPHER H.
分类号 B23K26/38;H01L21/48;H05K1/03;H05K3/00;H05K3/38;H05K3/42;(IPC1-7):H05K3/00 主分类号 B23K26/38
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