发明名称 METHOD AND DEVICE FOR FORMING THIN FILM FOR LIQUID CRYSTAL DISPLAY
摘要 PROBLEM TO BE SOLVED: To contribute to the formation of a thin film which is capable of constituting a liquid crystal display for making it easy to see a picture by reducing the reflectivity of outer light (sunlight and indoor light). SOLUTION: A gaseous mixture of oxygen/nitrogen and gaseous argon are introduced into the front of a cathode 7 provided with a target 8 consisting of a metal so that the slope of the gaseous oxygen-partial pressure in the moving direction of a transparent board 2 attains a prescribed value to form a thin film of metallic oxide on the surface of the transparent substrate 2 by reactive sputtering of the target 8. The thin film has a prescribed slope of composition ratio in the film thickness direction. The slope of the composition ration is adjusted by adjusting the quantity of gaseous nitrogen to be mixed into gaseous oxygen.
申请公布号 JPH0915585(A) 申请公布日期 1997.01.17
申请号 JP19950191180 申请日期 1995.07.03
申请人 ANELVA CORP 发明人 IWATA HIROSHI;YOSHIOKA KATSUYA
分类号 G02B5/20;C23C14/00;C23C14/02;C23C14/56;G02F1/13;G02F1/1335 主分类号 G02B5/20
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