| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an improved aligner, a method using the device and an exposure method having a system combining a quadrupole exposure system with a circular exposure system. SOLUTION: A filter 6b limiting light from a light source, a condenser lens 6c refracting and diffracting light from the filter 6b, a mask 6d and a lens 6e focusing light from the mask 6d on a wafer 6f are provided. The filter 6b provides with first group holes including four holes and with second group holes. These can maintain higher resolution than a conventional deformed aligner and can form a distribution of averaged light strength on an image forming plate (or on a wafer). Also a contact hole pattern with a nearly circular form can be formed and the proximity effect can be shortened by image forming information, which is included in the light passing through the mask pattern, being averaged.</p> |
