METHOD AND APPARATUS FOR FINELY PROCESSING TEFLON

摘要

PURPOSE: To finely process Teflon having high aspect ratio and easily processing with a large area by heating the surface of the Teflon of an object to be processed, and applying ultraviolet radiation having a specific wavelength to the surface of the object to be processed via a mask. CONSTITUTION: Radiated light 2 including ultraviolet radiation having a wavelength of 160nm is emitted from the electron locus 1 stored in a synchrotron along an optical axis 5. An object 4 to be processed is disposed at the position of a distance L from a light source along the axis 5. A mask 3 is disposed at a gap G forward of the object 4 to be processed. An area for substantially transmitting the light and an area for not transmitting it are formed on the surface of the mask 3. The light 2 is directed to the object to be processed via the mask 3. An ablation of the light 2 occurs on the surface of the object 4 to be processed, and the part emitted with the light 2 is released. A fine pattern is formed on the mask 3 to finely process the object 4 to be processed.