| 摘要 |
PURPOSE: To form a good fine wiring pattern by avoiding a trouble on machining while functioning as a reflection prevention film. CONSTITUTION: A lamination film of an SiO2 film 23 and an Si3 N4 film 24 is used as a reflection prevention film on a WSi2 film 22. Thereby, adhesion is improved and a reflection prevention film in a heat treatment process can be prevented from peeling. In the process, a film thickness should be chosen to minimize reflectance as a reflection prevention film. As for 365 manometers of i beam wavelength which is usually used as a light source of resist exposure, the SiO2 film of about 200Åand the Si3 N4 film of about 150Åminimize reflectance.
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