发明名称 PRODUCTION OF SINTERED COMPACT FOR TRANSPARENT CONDUCTIVE FILM FORMATION
摘要 PURPOSE: To provide a large-sized seamless high-density sintered compact by compacting to slurry by a high pressure slip casting process. CONSTITUTION: The slurry, containing indium type oxide powder with (5 to 50)m<2> /g BET value as solid, is compacted. A mold is prepared by using a complex consisting of h-BN type complex ceramics and/or synthetic resin and inorganic compound powder. The pore diameter and pressure-resisting strength of the mold are regulated to 0.3-10&mu;m and >=300kg/cm<2> , respectively. The slurry is poured into the mold and a pressure of >=2&times;10<5> Pa is directly applied to the slurry to mold it. By using the high pressure slip casting process, compacting velocity can be increased to a greater extent and a green compact reduced in water content can be formed in a short time, and further, compacting density can be increased. The green compact is dried and sintered, by which the sintered compact for transparent conductive film formation can be obtained.
申请公布号 JPH08325716(A) 申请公布日期 1996.12.10
申请号 JP19950131462 申请日期 1995.05.30
申请人 HITACHI METALS LTD 发明人 FUKUSHIMA HIDEKO
分类号 C04B35/00;B22F3/22;C01G19/00;C04B35/457;C04B35/495;C23C14/34;H01B13/00 主分类号 C04B35/00
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