发明名称 PHOTOCATALYTIC SEMICONDUCTOR COATING PROCESS
摘要 <p>The present invention discloses a simplified method for coating a substrate with photocatalytic semiconductor by mixing photocatalytic semiconductor powder with water to form a mixture, reducing said pH of the mixture to below about 4, sonicating the mixture, coating the substrate therewith, and illuminating the coated substrate with ultra-violet.</p>
申请公布号 WO1996037636(A1) 申请公布日期 1996.11.28
申请号 US1996005868 申请日期 1996.04.25
申请人 发明人
分类号 主分类号
代理机构 代理人
主权项
地址
您可能感兴趣的专利