| 摘要 |
The invention concerns a process for the formation of an electroless copper deposit from a plating bath comprising an aqueous solution containing a copper compound, a complexing agent for copper, a reducing agent for copper, a pH-adjusting agent, an additive selected from the group consisting of soluble inorganic silicon compounds and soluble inorganic germanium compounds, and in which process an oxygen containing gas is injected into the solution. Electrolessly deposited copper with improved properties of smoothness and elongation is obtained by controlling one or more of the plating bath parameters pH, complexing agents, sources of iron so as to limit the content of trace iron in the deposited copper layer to a value below 1.5 mg per mole of copper. Printed wiring boards manufactured in accordance with the invention display improved resistance to thermal stress and thermal cycling of copper plated-through holes. The achieved improvements are enhanced by the addition of vanadium to the plating bath. |
