发明名称 |
Method of manufacturing chemically adsorbed film |
摘要 |
<p>According to the invention, a chemically adsorbing material is reacted with a substrate surface having active hydrogen groups by dipping the substrate into a solution of the chemically adsorbing material simultaneous and applying ultrasonic waves to the solution. In this way, a high concentration monomolecular and/or polymer film substantially free from pin holes can be formed in a short period of time. That is, while the ultrasonic waves are applied, a chemical adsorbing material having an end functional chlorosilyl group is adsorbed onto the substrate surface, thereby forming a chemically adsorbed monomolecular and/or polymer film. The frequency of the ultrasonic waves are suitably in a range of 25 to 50 kHz. In addition, after formation of the adsorbed film, the substrate is washed for making monomolecular film by dipping it in a washing solution while applying ultrasonic waves. In this way, non-reacted chemical adsorbing material remaining on the substrate can be efficiently washed away. <IMAGE></p> |
申请公布号 |
EP0492417(B1) |
申请公布日期 |
1996.11.20 |
申请号 |
EP19910121741 |
申请日期 |
1991.12.18 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
YAMAGATA, YOSHIKAZU;MINO, NORIHISA;OGAWA, KAZUFUMI;SOGA, MAMORU |
分类号 |
B05D1/18;C03C17/30;C04B41/45;C04B41/49;C04B41/81;C04B41/84;C09D4/00;H01L21/312;(IPC1-7):B05D1/20;C03C17/28;C08J7/04;H01L21/00;C04B41/82;C23C22/02 |
主分类号 |
B05D1/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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