| 发明名称 |
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| 摘要 |
PURPOSE:To increase the pretilt angle of liquid crystal molecules by irradiating the main surface of a substrate provided with an X-ray resist layer with a parallel X rays at a specific angle and then dipping the substrate in a liquid developer and rinsing liquid. CONSTITUTION:The main surface of the substrate 15 provided with the X-ray resist layer 14 is irradiated with the parallel X rays at the specific angle alphaand then dipped in the liquid developer and rinsing liquid. The X rays are an electrode wave whose wavelength is 0.1-50Angstrom and a soft X rays (4-50Angstrom wavelength) is easy to use. The X-ray resist layer 14 is exposed to the X rays and dipped in the liquid developer and rinsing liquid to have an irregular X-ray resist layer, so that the liquid crystal molecules are oriented. Then the X rays are projected slantingly to obtain a saw-tooth X-ray resist layer. Consequently, the pretilt angle of the liquid crystal molecules is increased. |
| 申请公布号 |
JP2553636(B2) |
申请公布日期 |
1996.11.13 |
| 申请号 |
JP19880148542 |
申请日期 |
1988.06.16 |
| 申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
YAMAZOE HIROSHI;FUJITA SHINGO;SUMIDA SHIRO;OOTA ISAO |
| 分类号 |
G02F1/1337;(IPC1-7):G02F1/133 |
主分类号 |
G02F1/1337 |
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